In our lab, we have developed an atmospheric pressure plasma jet (APPJ) system for depositing transparent conductive oxides (TCOs). While conventional TCO deposition typically involves complex and costly vacuum-based processes, our approach simplifies the procedure, enabling a more accessible and cost-effective solution. We are advancing APPJ technology to deposit high-quality, low-cost nanoscale transparent conductive films to support large-area applications such as display technologies and solar cell panels.